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添加劑在離子液體電沉積金屬及合金中的應用

Application of additives for the electrodeposition of metals and alloys from ionic liquids

  • 摘要: 近年來,基于離子液體電沉積制備金屬和合金鍍層已被廣泛應用于多個研究領域,其電沉積過程可以克服傳統水溶液體系電化學窗口窄、易受析氫副反應干擾等缺陷;相較于高溫熔鹽體系,離子液體可在溫和條件下電沉積制備活潑金屬及其合金. 離子液體具有較高的黏度,導致離子遷移速率低,電沉積過程中易產生濃差極化,從而影響沉積產物的品質和性能. 通過向離子液體電沉積體系中引入添加劑可以改變活性物種的電化學還原電位,進而影響晶粒的電化學結晶過程,顯著改善沉積層的微觀結構和性能. 本文歸納總結了添加劑對離子液體中電沉積活潑金屬、過渡金屬和貴金屬及其合金等方面的研究進展,系統分析了當前添加劑在離子液體電沉積金屬及合金過程中的作用機理、效用和局限性,并展望了未來離子液體電沉積添加劑的重點研究方向.

     

    Abstract: Ionic liquids (ILs) are a new class of green electrolyte systems owing to their unique characteristics of no proton interference, wide electrochemical window, low vapor pressure, good electrical conductivity, and low melting point. Electrodeposition is a promising high-precision coating method for the tunable preparation of high-performance metal-based film materials. Remarkably, electrodeposition can be easily tuned by tailoring the operating parameters, such as current density, type of current control, potential applied and the deposition model, electrolyte composition and pH, temperature, and the choice of additives, thus garnering various industrial applications. Recently, preparing metal and alloy coatings electrodeposited from ILs has been widely used in materials synthesis, catalysis, electrochemical energy storage, and other fields. Metal and alloy electrodeposition from ILs can address the drawbacks of conventional aqueous systems, such as limited electrochemical windows and easy interference from hydrogen evolution side reactions. Unlike high-temperature molten salts, ILs can be used for the electrodeposition of active metals (such as aluminum, titanium, and rare earth metals) and their alloys at low temperatures and under relatively mild conditions. Nevertheless, ILs have high viscosity, leading to a low ion migration rate and easy-to-produce concentration polarization during the electrodeposition process, thus impacting the quality and performance of the deposited products and restricting large-scale preparation. Introducing efficient additives can optimize the solvent environment, modify the electrochemical reduction potential of the active species in the IL electrodeposition system, influence the electrochemical crystallization process of the electrodeposited grains, and significantly enhance the microstructure and performance of the deposited layer. However, an effective screening approach is still required, and the action mechanism of additives should be intensively studied. Examining highly efficient and functional additives appropriate for IL electrodeposition systems is crucial to advancing their industrial applications; however, they still face challenges. In this review, recent research progress on additives for the electrodeposition of active, transition, and noble metals and their alloys from ILs is summarized. Moreover, the mechanism, utility, and limitations of the existing additives during the electrodeposition process are systematically analyzed, and the future research directions of these additives for metal and alloy electrodeposition from ILs are prospected. This review can provide researchers with a comprehensive and systematic understanding and stimulate research breakthroughs to accelerate the large-scale application of additive-assisted electrodeposition technology from ILs.

     

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