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電沉積和硒化制備CuInSe2薄膜

Preparation of CuInSe_2 thin films by electrodeposition and selenization

  • 摘要: 以石墨為陽極、鈦片為陰極,采用恒電流法制備Cu-In預制膜,然后硒化處理得到CuInSe2薄膜.分析了預制膜和CuInSe2薄膜的相組成及其影響因素.結果表明:采用不同的電沉積工藝,可以得到不同相組成的Cu-In預制膜.在保證Cu/In小于1的條件下,降低InCl3濃度和H3Cit/CuCl2濃度比,選擇較高電流,可以獲得具有CuIn相和Cu2In相的Cu-In預制膜.含有CuIn相和Cu2In相的Cu-In預制膜,經硒化得到的CuInSe2薄膜具有單一CuInSe2相組成,并且符合化學劑量比要求;而只含有CuIn相的預制膜硒化后除了有CuInSe2相外還出現了CuSe相.

     

    Abstract: CuInSe2 thin films were prepared by selenization of electrodeposited Cu-In precursors on Ti substrate under constant current with a carbon rod worked as anode. The phase composition and its influencing factors of Cu-In precursor films and CuInSe2 thin films were studied. The results show that controlling deposition parameters can change the phase composition of Cu-In precursor films. When the atomic ratio of Cu/In is less than 1, the precursors containing the Culn phase and the Cu2In phase are obtained at a lower concentration of InCl3, a lower concentration ratio of H3Cit to CuCl2 and a higher current density. Stoichiometric CuInSe2 films with a single chalcopyrite phase are synthesized from Cu-In precursors containing the Culn phase and the Cu2In phase. The CuSe phase occurs in addition to the CuInSe2 chalcopyrite phase in Cu-rich CuInSe2 films synthesized from Cu-In precursors with only the Culn phase. Cu-In precursors with both the Culn and Cu2In phases are favorable for CuInSe2 films.

     

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