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大規模集成電路導電薄膜的織構效應

Texture Effect of Interconnection Thin Films in Very Large-Scale Integrated Electronic Circuits

  • 摘要: 利用X射線技術檢測了普通工藝和改進工藝制備的內聯導電鋁膜的織構.分析表明,高體積量且鋒銳的111面織構可以大幅度降低大規模集成電路芯片的失效率.討論了失效的原因及111織構的有利作用.指出了新一代內聯導電銅膜相應織構問題的重要性.

     

    Abstract: The texture of interconnecting aluminum films prepared by conventional and modified technology was examined using X-ray diffraction It is demonstrated, that the high volume fraction and high sharpness of the 111 fiber texture will drastically reduce the invalidation ratio of very large-scale integrated electronic circuits. The reasons of invalidation and the positive effects of the 111 fiber texture are discussed. It is pointed out, that attention should be paid to the corresponding texture problems in new interconnecting copper films.

     

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