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Volume 18 Issue 5
Nov.  2021
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Article Contents
Wang Jianjun, Lu Fanxiu. Infrared Optical Properties of Diamond Films Deposited at Low Temperatures[J]. Chinese Journal of Engineering, 1996, 18(5): 419-423. doi: 10.13374/j.issn1001-053x.1996.05.005
Citation: Wang Jianjun, Lu Fanxiu. Infrared Optical Properties of Diamond Films Deposited at Low Temperatures[J]. Chinese Journal of Engineering, 1996, 18(5): 419-423. doi: 10.13374/j.issn1001-053x.1996.05.005

Infrared Optical Properties of Diamond Films Deposited at Low Temperatures

doi: 10.13374/j.issn1001-053x.1996.05.005
  • Received Date: 1996-05-18
    Available Online: 2021-11-13
  • Optical smooth diamond films have been deposited at low temperatures (400~700℃) and their IR properties were studied for infrared optical coating applications.High density diamond nucleation was realized by a "Two Step Process" in which a high methane concentration was used for nucleation enhancement. However, biasing was shown insufficient for nucleation enhancement at low temperatures.Transmittance as high as 80% for diamond coated single crystal silicon wafer was observed.This level of IR transmission is good enough for practical applications of Si windows in a severe atmosphere.

     

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